Don Chernoff is a leader in AFM and SEM analysis. His process to accurately measure the size, shape and position of features in AFM and SEM images is in use worldwide. It helped make DVD possible and it supports more than half the world’s production of DVD and Blu-Ray discs. He discovered that phase imaging in Atomic Force Microscopy provides important and useful contrast between material domains on surfaces, another technique used worldwide. Earlier, he worked in laser spectroscopy, optics and electron microscopy. He has over 25 years of industrial research and engineering experience, including 8 years at BP America, 2 years at Roche Diagnostics, and, since 1990, at Advanced Surface Microscopy, Inc., where he specializes in practical applications of AFM to solve processing and materials problems. Since 1990, Don and his colleagues have done more than 1000 AFM analysis projects for more than 200 customers involving more than 100 different kinds of materials and devices. Don was educated at the University of Chicago (B.S. Chemistry 1973, Ph.D. Physical Chemistry 1978). He has over 40 publications and 2 patents. Don has been an invited speaker at many national and international conferences, including Nanotech, Replitech, IDEMA hard disk technical conference, Pittcon and American Society of Materials.