Deirdre Olynick is a staff scientist at Lawrence Berkeley National Laboratory’s (LBNL) Molecular Foundry, one of five DOE user facilities supporting nanoscience. She works in the Molecular Foundry’s Nanofabrication Facility specializing in electron beam lithography, electron beam resists, and plasma etching. In addition, she is running a program in nanoimprint lithography.

She received a B.S. degree in engineering from North Carolina State University in 1991, and a Ph.D. degree in Materials Science and Engineering from the University of Illinois in 1996 where she was a Fannie and John Hertz Fellow. From 1996-1998 she worked in the semiconductor industry, including at Applied Materials, where she investigated CVD TiN thin films. In 1998, she joined LBNL as a staff scientist in the Center for X-ray Optics in the area of electron beam lithography and nanofabrication. In 2006 she moved to the LBNL Molecular Foundry.

In addition to cultivating her research programs, she works with users from academia and industry developing new nanoscale devices and processes for nanoscience and technology. More information about becoming a user at the Molecular Foundry can be found at www.foundry.lbl.gov.